ANMS – Alberta Nano-Monitoring Systems Ltd. | Innovative On-Line Particle Analyzer | Call Us: (877) 545-5070

Date:July 11, 2014


In the Semicon industry with patterns down to the 10 nm range, nano particles contamination affects yield. The detection of these particles down to 20nm and below is critical for the process.

The ANMS POLA 355™  is designed to in-process  detect down to 20 nm particles in the different steps of the semiconductors manufacturing  processes.